Physical and Optical Properties of Cobalt Doped Nickel Oxied Thin Films Fabricant Semiconductor

Authors

  • Chouaieb Zaouche University of Biskra
  • Laid Dahbi Education College of Setif
  • Sofiane Seggai Higher School of Agriculture Sahrian in El Oued

DOI:

https://doi.org/10.59287/as-proceedings.432

Keywords:

Optical Properties of Cobalt, Thin Films, Semiconductor

Abstract

Nickel oxide is one of the most important semiconductor materials in the environmental field due to the detecting ability of toxic gases. Nickel oxide (NiO) has a several different applications in the field pizoelectronic, optoelectronic. Moreover, it is used to find suitable material with enhanced properties for gas sensing applications for detecting the sensibility in the environment such as NOx, SOx, CO, CO2…, at high temperature. However, several studies have been made to find that the NiO have a high optical transparency and good electrical conductivity at various experimental conditions. NiO thin films have a direct band gap ranging from 3.5 to 4.3 eV.

Author Biographies

Chouaieb Zaouche, University of Biskra

Material Sciences Department, Faculty of Science, 07000 Biskra, Algeria

Laid Dahbi, Education College of Setif

Teacher  Messaoude Zeghar, Algeria

Sofiane Seggai, Higher School of Agriculture Sahrian in El Oued

Algeria.

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Published

2023-12-11

How to Cite

Zaouche, C., Dahbi, L., & Seggai, S. (2023). Physical and Optical Properties of Cobalt Doped Nickel Oxied Thin Films Fabricant Semiconductor. AS-Proceedings, 1(6), 10–12. https://doi.org/10.59287/as-proceedings.432